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J. Semicond. Volume 40, Number 12, December 2019
Magnetic LEGO: van der Vaals interlayer magnetism
Lifeng Yin
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/120201
Research status and prospects of deep ultraviolet devices
Hideki Hirayama
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/120301
Laser fabrication of graphene-based soft robots
Bing Han, Yong-Lai Zhang
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/120401
III-nitride based ultraviolet laser diodes
Degang Zhao
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/120402
Preface to the Special Topic on Deep Ultraviolet Light-Emitting Materials and Devices
Jinmin Li, Xinqiang Wang, Dabing Li, Tongbo Wei
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/120101
Nasir Alfaraj, Jung-Wook Min, Chun Hong Kang, Abdullah A. Alatawi, Davide Priante, Ram Chandra Subedi, Malleswararao Tangi, Tien Khee Ng, Boon S. Ooi
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/121801
Recent progress of SiC UV single photon counting avalanche photodiodes
Linlin Su, Dong Zhou, Hai Lu, Rong Zhang, Youdou Zheng
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/121802
The fabrication of AlN by hydride vapor phase epitaxy
Maosong Sun, Jinfeng Li, Jicai Zhang, Wenhong Sun
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/121803
Growth properties of gallium oxide on sapphire substrate by plasma-assisted pulsed laser deposition
Congyu Hu, Katsuhiko Saito, Tooru Tanaka, Qixin Guo
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122801
Mussaab I. Niass, Muhammad Nawaz Sharif, Yifu Wang, Zhengqian Lu, Xue Chen, Yipu Qu, Zhongqiu Du, Fang Wang, Yuhuai Liu
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122802
Study of the morphology evolution of AlN grown on nano-patterned sapphire substrate
Zhuohui Wu, Jianchang Yan, Yanan Guo, Liang Zhang, Yi Lu, Xuecheng Wei, Junxi Wang, Jinmin Li
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122803
Hot electron effects on the operation of potential well barrier diodes
M. Akura, G. Dunn, M. Missous
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122101
Yong Chen, Yang Zhao, Qiufeng Ye, Zema Chu, Zhigang Yin, Xingwang Zhang, Jingbi You
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122201
Raheela Rasool, Najeeb-ud-Din, G. M. Rather
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122401
Contact etch process optimization for RF process wafer edge yield improvement
Zhangli Liu, Bingkui He, Fei Meng, Qiang Bao, Yuhong Sun, Shaojun Sun, Guangwei Zhou, Xiuliang Cao, Haiwei Xin
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122402
Selection of DBO measurement wavelength for bottom mark asymmetry based on FDTD method
Buqing Xu, Qiang Wu, Lisong Dong, Yayi Wei
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122403
Column readout circuit with improved offset mismatch and charge sharing for CMOS image sensor
Zhongjie Guo, Ningmei Yu, Longsheng Wu
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122404
Simulation and application of external quantum efficiency of solar cells based on spectroscopy
Guanlin Chen, Can Han, Lingling Yan, Yuelong Li, Ying Zhao, Xiaodan Zhang
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122701
C. Usha, P. Vimala
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122901
Improvement of tunnel compensated quantum well infrared detector
Chaohui Li, Jun Deng, Weiye Sun, Leilei He, Jianjun Li, Jun Han, Yanli Shi
J. Semicond. 2019, 40(12): 10.1088/1674-4926/40/12/122902
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